Atomic Layer Deposition

Atomic Layer Deposition

Batch Thermal ALD for High Volume Manufacturing

The new Firebird Batch Thermal Atomic Layer Deposition (ALD) system is a fully automated system for specialized wafer production. Building on the leading technology and performance of Veeco’s Phoenix® ALD reactor, Firebird delivers superb uniformity with best-in-class throughput at the lowest possible cost-per-wafer.  Ideal for producing single and multi-component oxide films, including encapsulation, barrier layers and optical coatings, Firebird supports the growing demand for ALD on specialized wafers in the RF, display, power electronics, optics and MEMS markets. 

Veeco's atomic layer deposition systems (Firebird, Savannah, Fiji, and Phoenix) are designed to deposit pinhole free coatings that are perfectly uniform in thickness, even deep inside pores, trenches and cavities.

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