Veeco's production-proven MOCVD technology will drive down the cost of LEDs and accelerate adoption.
Veeco's solutions provide the high performance and low cost of ownership required to support advanced packaging needs.
Veeco MOCVD systems provide key advantages for GaN-on-Si production, including low particle counts and excellent yields.
Automated process equipment brings ultra-precision epitaxially grown wafers in the RF market.
Veeco's systems allow for precision control of complex thin film layer structures that result in smaller form factors and integrated combination devices.
Veeco’s solutions provide the high performance and low cost of ownership required to address semiconductor manufacturers’ material deposition, removal, and surface preparation needs.
Veeco provides the resources needed to create breakthrough discoveries in epitaxial crystal growth.
Veeco's systems and components offer superior uniformity, innovative design and proven capital efficiency for both precision optical coatings and optoelectronics devices.
Veeco is committed to driving down manufacturing cost and increasing innovations to enable even higher areal densities.